Deep level transient spectroscopy on radioactive impurities: Demonstration for Si:111In*
Identifieur interne : 000388 ( Main/Exploration ); précédent : 000387; suivant : 000389Deep level transient spectroscopy on radioactive impurities: Demonstration for Si:111In*
Auteurs : RBID : ISTEX:339_1991_Article_BF00323866.pdfEnglish descriptors
Abstract
A defect specific analysis technique is introduced that combines the high concentration sensitivity of deep level transient spectroscopy (DLTS) with the radioactive transmutation of probe atoms; this technique results in the chemical identification of particular atoms which participate in the observed defect centres. The method is demonstrated for n- and p-type silicon samples, which are implanted with radioactive 111In* ions. The activity of the indium ions decreases with half-life T1/2 of 2.83 d by a decay into stable cadmium ions. A series of Cd-related levels whose concentrations increase exponentially with the decay time of 111In* are identified in the DLTS spectra. Cd-diffused silicon samples are investigated for comparison; these samples reveal similar DLTS spectra. The analysis method described can be extended to all semiconductors and to a variety of radioactive probe atoms.
DOI: 10.1007/BF00323866
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<author><name>G. Pensl</name>
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<author><name>M. Gebhard</name>
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<author><name>N. Achtziger</name>
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<front><div type="abstract" xml:lang="eng">A defect specific analysis technique is introduced that combines the high concentration sensitivity of deep level transient spectroscopy (DLTS) with the radioactive transmutation of probe atoms; this technique results in the chemical identification of particular atoms which participate in the observed defect centres. The method is demonstrated for n- and p-type silicon samples, which are implanted with radioactive 111In* ions. The activity of the indium ions decreases with half-life T1/2 of 2.83 d by a decay into stable cadmium ions. A series of Cd-related levels whose concentrations increase exponentially with the decay time of 111In* are identified in the DLTS spectra. Cd-diffused silicon samples are investigated for comparison; these samples reveal similar DLTS spectra. The analysis method described can be extended to all semiconductors and to a variety of radioactive probe atoms.</div>
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<abstract lang="eng">A defect specific analysis technique is introduced that combines the high concentration sensitivity of deep level transient spectroscopy (DLTS) with the radioactive transmutation of probe atoms; this technique results in the chemical identification of particular atoms which participate in the observed defect centres. The method is demonstrated for n- and p-type silicon samples, which are implanted with radioactive 111In* ions. The activity of the indium ions decreases with half-life T1/2 of 2.83 d by a decay into stable cadmium ions. A series of Cd-related levels whose concentrations increase exponentially with the decay time of 111In* are identified in the DLTS spectra. Cd-diffused silicon samples are investigated for comparison; these samples reveal similar DLTS spectra. The analysis method described can be extended to all semiconductors and to a variety of radioactive probe atoms.</abstract>
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